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ST6545 Molybdenum Rotary Target

Catalog No. ST6545
Material Mo
CAS Number 7439-98-7
Dimensions Customized
Purity ≥99.95% or 99.97%
Density ≥10.15 g/cm3
Form Target

Molybdenum Rotary Sputtering Targets are high-performance materials designed for thin-film deposition in large-area coating applications. Stanford Advanced Materials (SAM) provides high-purity molybdenum rotary sputtering targets for thin-film deposition in displays, solar cells, and optical coatings. These targets ensure uniform film quality, excellent conductivity, and long service life, with customizable options to meet various industry needs.

Other shapes: Molybdenum Sputtering Target, Planar Molybdenum (Mo) Sputtering Target

Related Products: Molybdenum Rhenium Sputtering Target, Molybdenum Disilicide Sputtering Target, Molybdenum Silicon Sputtering Target, Molybdenum Selenide Sputtering Target, Molybdenum Boride Sputtering Target

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This Item
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Material
Mo
CAS Number
7439-98-7
Dimensions
Customized
Purity
≥99.95% or 99.97%
Density
≥10.15 g/cm3
Form
Target
 
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Dimensions
Customized
CAS Number
7440-03-1
Grade
R04200 R04210
Standard
ASTM B393
Form
Target
Purity
≥99.9%
 
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Material
R4251 (Nb-1Zr) R4261 (Nb-1Zr)
Surface finish
Polished
Dimensions
Circular Targets Diameter 10-400 mm Thickness 2-28 mm
Purity
99.9% 99.95% 99.99%
 
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Material
90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity
>=99.99%
Density
7.1g/cm3

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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