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ST0334 Indium Tin Oxide (ITO) Sputtering Targets

Catalog No. ST0334
Material 90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity >=99.99%
Density 7.1g/cm3

Deposited by magnetron or other sputtering techniques, Indium Tin Oxide (ITO) target is used for the ITO coated substrates including electrodes for flat panel displays, touch panel contacts, energy saving automobile and building window glass, optoelectronic devices, solar panels, etc. Stanford Advanced Materials provide high-quality ITO targets with different dimensions to our customers.

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Indium Tin Oxide (In2O3/SnO2) Sputtering Target
Indium Tin Oxide (In2O3/SnO2) Sputtering Target
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This Item
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Material
90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity
>=99.99%
Density
7.1g/cm3
 
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Add to Compare
Material
90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity
>=99.99%
Density
7.1g/cm3
 
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Material
Indium Iron Oxide (InFe2O4)
Purity
99.9%%
Shape
Powder/ Granule/ Custom-made
 
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Material
Indium Oxide (In2O3)
Purity
99.9% ~ 99.99%
Shape
Powder/ Granule/ Custom-made

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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