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  • Molybdenum
  • ST0030 Molybdenum (Mo) Sputtering Target

    • ST0030 Molybdenum (Mo) Sputtering Target

    Catalog No. ST0030
    Dimensions Customized
    Material Molybenum, Mo
    Density 9.8 - 10.2 g/cm3
    Shape Disc, Planar, or Custom-made
    Purity ≥99%, 99.95%, or customized
    Synonyms Molybdenum Sputtering Target, Mo Target

    Molybdenum sputtering targets are high-purity materials used in thin-film deposition processes for applications such as semiconductors, solar cells, and flat panel displays, offering excellent thermal and electrical conductivity. Stanford Advanced Materials is a trusted supplier of Molybdenum Sputtering Target and other sputtering target materials.

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    Molybdenum Sputtering Target 99.95%, Dia. 6 inch
    Molybdenum Sputtering Target 99.95%, Dia. 6 inch
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    This Item
    ST0030 Molybdenum (Mo) Sputtering Target
    Add to List
    Dimensions
    Customized
    Material
    Molybenum, Mo
    Density
    9.8 - 10.2 g/cm3
    Shape
    Disc, Planar, or Custom-made
    Purity
    ≥99%, 99.95%, or customized
    Synonyms
    Molybdenum Sputtering Target, Mo Target
     
    ST0048 Tantalum Sputtering Target (Ta Sputtering Target)
    Add to List
    Add to Compare
    Material
    Ta≥99%, or customized
    Shape
    Disc, Planar, or Custom-made
    Purity
    ≥99%
    Synonyms
    Tantalum Sputtering Target, Ta Target
     
    ST0033 Niobium (Nb) Sputtering Target
    Add to List
    Add to Compare
    Composition
    Nb
    CAS Number
    7440-03-1
    Purity
    ≥99%
    Shape
    Discs, or Custom-made
    Diameter
    2", 3", 4", 5", 6", or customized
    Thickness
    0.25", 0.125", or customized
    Bond Type
    Copper, or customized
    Synonyms
    Niobium Sputtering Target, Nb Target
     
    ST0406 Planar Tungsten (W) Sputtering Target
    Add to List
    Add to Compare
    Composition
    W
    CAS Number
    7440-33-7
    Purity
    ≥99%
    Shape
    Planar, or Custom-made

    FAQ

    What is the standard purity of your molybdenum targets? Do you offer higher purity options?

    Our standard purity is ≥99%. We also offer higher grades (e.g., 99.95%) and custom purities upon request. The choice depends on your specific thin-film requirements, such as electrical conductivity or impurity tolerance.

    Can you control the grain structure or crystallographic orientation of the targets?

    Yes. We optimize grain size and orientation through rolling and heat treatment processes to minimize particle generation and enhance film uniformity during sputtering.

    What shapes and sizes are available? Is there a minimum order quantity (MOQ)?

    We supply standard discs (2″, 3″, 4″ diameters) and offer full customization in shape (planar, rectangular, annular) and dimensions. MOQ depends on purity and size—please contact our sales team for a tailored quote.

    Do you provide bonding services (e.g., indium, elastomer bonding)?

    Yes. We offer various bonding options to ensure optimal thermal/electrical contact between the target and backing plate. Recommendations are based on your sputtering system type (DC, RF, magnetron).

    Which deposition processes are these targets suitable for?

    Primarily designed for DC magnetron sputtering, they are also compatible with pulsed DC and RF sputtering. Common applications include semiconductor gate/barrier layers, TCO films for solar cells, and conductive layers in flat-panel displays.

    How should I handle and prepare the target before use?

    We recommend cleaning the sputtering surface with isopropyl alcohol to remove any contaminants. For long-term storage, keep the target in its original vacuum-sealed packaging to prevent oxidation.

    How are targets packaged to prevent damage during shipping?

    Small targets are packed in anti-static PP boxes with vacuum sealing; larger ones are secured in custom wooden crates with foam inserts. All packaging meets international shipping standards (IMDG) for safe transit.

    Can you recommend sputtering process parameters?

    Yes. Based on your equipment and application, we can suggest starting parameters (e.g., power density, Ar pressure, target-to-substrate distance) for efficient deposition.

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    GET A QUOTE

    Send us an inquiry today to learn more and receive the latest pricing. Thank you!

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    * Country

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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