ST0058 Zinc (Zn) Sputtering Target

Name: ST0058 Zinc (Zn) Sputtering Target
SKU: ST0058
Availability: InStock
Rating: 4.9 (166 reviews)

Catalog No.	ST0058
Composition	Zn
CAS Number	7440-66-6
Purity	≥99% (99.99% / 99.999% available)
Shape	Discs, or Custom-made
Diameter	2", 3", 4", 5", 6", or customized
Thickness	0.25", 0.125", or customized
Bond Type	Copper, or customized
Synonyms	Zinc Sputtering Target, Zn Target, High Purity Zinc Target

Stanford Advanced Materials (SAM) supplies high-purity Zinc (Zn) Sputtering Targets for thin film deposition applications requiring reliable conductive layers. Zinc targets are widely used in the production of transparent conductive oxides (TCOs), particularly for display panels, photovoltaic cells, and optoelectronic devices. Our Zn targets are vacuum melted and precision machined to achieve fine grain structure and >99% relative density, supporting consistent DC sputtering performance and uniform film deposition. Available in standard disc geometries or custom configurations, with copper bonding options for optimized thermal management.

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ST0058 Zinc (Zn) Sputtering Target

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Composition

CAS Number

7440-66-6

Purity

≥99% (99.99% / 99.999% available)

Shape

Discs, or Custom-made

Diameter

2", 3", 4", 5", 6", or customized

Thickness

0.25", 0.125", or customized

Bond Type

Copper, or customized

Synonyms

Zinc Sputtering Target, Zn Target, High Purity Zinc Target

NB0036 Niobium Target, Nb Target

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Dimensions

Customized

CAS Number

7440-03-1

Grade

R04200 R04210

Standard

ASTM B393

Form

Target

Purity

≥99.9%

NBZ0047 Niobium Zirconium Alloy Sputtering Targets & Discs

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Material

R4251 (Nb-1Zr) R4261 (Nb-1Zr)

Surface finish

Polished

Dimensions

Circular Targets Diameter 10-400 mm Thickness 2-28 mm

Purity

99.9% 99.95% 99.99%

ST0334 Indium Tin Oxide (ITO) Sputtering Targets

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Material

90% In2O3+10% SnO2 / 95% In2O3+5% SnO2

Purity

>=99.99%

Density

7.1g/cm3

FAQ

Q: What purity zinc target do I need for solar cell applications?

A: For most photovoltaic applications (CIGS, perovskite, CdTe), we recommend 99.99% (4N) purity or higher. Lower purity can introduce impurities that affect carrier mobility and reduce cell efficiency.

Q: What is AZO and why is it important?

A: AZO (Aluminum-doped Zinc Oxide) is a transparent conductive oxide made by co-sputtering zinc with aluminum. It's increasingly used as a lower-cost alternative to ITO (Indium Tin Oxide) in displays and solar cells. If you're planning to make AZO films, let us know and we can recommend the right target configuration.

Q: Do zinc targets oxidize during storage?

A: Zinc can form a thin oxide layer when exposed to air. That's why we vacuum-seal all our zinc targets immediately after cleaning. Store them in the sealed packaging until ready to use, and consider a short pre-sputter burn-in to remove any surface oxide.

Q: What sputtering method works best for zinc?

A: Zinc is conductive, so DC sputtering works well. For pure Zn films, DC is recommended. For reactive sputtering (making ZnO or AZO), RF or pulsed DC with oxygen gas is typically used.

Q: Can you provide a target with controlled grain size?

A: Yes, we can control grain size during the manufacturing process. Fine grain size (<100 μm) is recommended for most sputtering applications to ensure uniform erosion. Please specify your requirement when ordering.

Q: Do you offer aluminum-doped zinc oxide (AZO) targets?

A: Yes, we offer AZO targets with various doping concentrations (typically 1-3% Al₂O₃). Please contact us with your specific requirements.

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Material	Zinc (Zn)
Purity	≥99% (99.99% / 99.999% available upon request)
CAS Number	7440-66-6
Color/Appearance	Bluish-silvery Gray
Melting Point	419.5°C
Density	7.14 g/cm³
Electrical Resistivity	5.9 µΩ·cm (at 20°C)
Sputter Type	DC, RF
Manufacturing Process	Vacuum Melting + Precision Machining
Grain Size	Controlled, fine-grain structure
Relative Density	>99%
Type of Bond	Copper backing plate (Indium or Elastomer bonding available)
Standard Shape	Disc
Standard Diameters	2", 3", 4", 5", 6"
Thickness Range	0.125", 0.25", or customized
Packaging	Vacuum-sealed in cleanroom conditions

Application Area	Specific Use
Display Industry	Transparent conductive electrodes for LCD, OLED, and touchscreen panels
Solar Energy	TCO layers for thin-film solar cells (CIGS, CdTe, Perovskite)
Semiconductor	Barrier layers, electrode materials, and thin film transistors
Optical Coatings	Transparent conductive coatings, anti-reflection layers
Automotive	Corrosion-resistant coatings for precision components
Sensor Technology	Piezoelectric ZnO films for gas sensors and acoustic wave devices
Research & Development	2D materials research, thin film characterization

Material	Zinc (Zn)
Purity	≥99% (99.99% / 99.999% available upon request)
CAS Number	7440-66-6
Color/Appearance	Bluish-silvery Gray
Melting Point	419.5°C
Density	7.14 g/cm³
Electrical Resistivity	5.9 µΩ·cm (at 20°C)
Sputter Type	DC, RF
Manufacturing Process	Vacuum Melting + Precision Machining
Grain Size	Controlled, fine-grain structure
Relative Density	>99%
Type of Bond	Copper backing plate (Indium or Elastomer bonding available)
Standard Shape	Disc
Standard Diameters	2", 3", 4", 5", 6"
Thickness Range	0.125", 0.25", or customized
Packaging	Vacuum-sealed in cleanroom conditions

ST0058 Zinc (Zn) Sputtering Target

Zinc (Zn) Sputtering Target Description

Zinc (Zn) Sputtering Target Specification

Zinc (Zn) Sputtering Target Applications

Zinc (Zn) Sputtering Target Packing

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FAQ

Q: What purity zinc target do I need for solar cell applications?

Q: What is AZO and why is it important?

Q: Do zinc targets oxidize during storage?

Q: What sputtering method works best for zinc?

Q: Can you provide a target with controlled grain size?

Q: Do you offer aluminum-doped zinc oxide (AZO) targets?

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