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Discontinued (Discontinued) ST0021 Indium (In) Sputtering Target

Catalog No. ST0021
Composition In
CAS Number 7440-74-6
Purity ≥99%
Shape Discs, or Custom-made
Diameter 2", 3", 4", 5", 6", or customized
Thickness 0.25", 0.125", or customized
Bond Type Copper, or customized

Indium (In) Sputtering Target is engineered to deliver exceptional performance and consistency in thin film deposition. Stanford Advanced Materials is committed to innovation, quality, and customer satisfaction, making it a trusted supplier for high-performance materials in advanced industrial applications.

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Indium (In) Sputtering Target
Indium (In) Sputtering Target
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This Item
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Composition
In
CAS Number
7440-74-6
Purity
≥99%
Shape
Discs, or Custom-made
Diameter
2", 3", 4", 5", 6", or customized
Thickness
0.25", 0.125", or customized
Bond Type
Copper, or customized
 
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Dimensions
Customized
CAS Number
7440-03-1
Grade
R04200 R04210
Standard
ASTM B393
Form
Target
Purity
≥99.9%
 
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Material
R4251 (Nb-1Zr) R4261 (Nb-1Zr)
Surface finish
Polished
Dimensions
Circular Targets Diameter 10-400 mm Thickness 2-28 mm
Purity
99.9% 99.95% 99.99%
 
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Material
90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
Purity
>=99.99%
Density
7.1g/cm3

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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