Strontium Titanate Single Crystal Substrate Description

SrTiO3 single crystal has its lattice parameters match most materials with a Perovskite crystal structure, and therefore it is a popular crystal substrate for epitaxial growth of many oxide thin films. It is commonly used as substrate material for superconductor thin films, because Strontium Titanate (SrTiO3) and Y-Ba-Cu-O system (a = 3.89 A) have similar values in the lattice constant.

Strontium Titanate Single Crystal Substrate Specifications

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Strontium Titanate Single Crystal Substrate Applications

Widely used in the research of high-temperature superconducting films. It is also widely used in special optical windows and high-quality sputtering targets.

Strontium Titanate Single Crystal Substrate Packaging

Our Strontium Titanate Single Crystal Substrate is carefully handled during storage and transportation to preserve the quality of our product in its original condition.

FAQs

Q1 Why is SrTiO3 a popular choice for single crystal substrates?

SrTiO3 is a popular choice due to its excellent lattice match with many oxide materials, its high dielectric constant, and its ability to support complex epitaxial growth. Additionally, it is highly stable under high temperatures and has a wide bandgap, which is crucial for a variety of advanced electronics applications.

Q2 What are the key properties of Strontium Titanate Single Crystal Substrates?

Key properties include:

• Lattice structure: Cubic crystal system with a perovskite structure
• Dielectric constant: High relative permittivity (about 300 at room temperature)
• Thermal stability: Excellent performance at high temperatures
• Electrical properties: High-quality insulating properties, ideal for semiconductor devices
• Optical properties: Transparent in the infrared spectrum

Q3 How do Strontium Titanate Substrates support epitaxial growth?

SrTiO3 substrates provide a lattice structure that closely matches the crystal lattice of many materials, making it an excellent choice for epitaxial growth. This alignment helps to reduce strain and defects in thin films, improving the overall quality and performance of the deposited layers.